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Home > chinese-english > "dry etch" in English

English translation for "dry etch"

干法刻蚀

Related Translations:
etched:  刺耳蚀刻蚀像
etching ink:  腐蚀墨水耐酸漆
etch plain:  刻蚀平原
color etching:  着色腐蚀
etching knife:  蚀刻刀
sideways etch:  侧向腐蚀
etching pattern:  侵蚀图侵蚀形态蚀刻模式
mask etch:  掩蔽腐蚀, 掩模刻蚀
secco etching:  射哥蚀刻
sirtl etching:  沙特蚀刻
Example Sentences:
1.Nitrogen trifluoride a new dry etching gas
一种新型干蚀刻气
2.Dry etching of molybdenum film in fabrication of thin film transistor liquid crystal display
液晶阵列工艺中金属钼的干法刻蚀研究
3.The principle and the main parameters of the dry etching for silicon dioxide are introduced
摘要阐述了二氧化矽干法蚀刻的原理和主要的蚀刻参数。
4.To approach as a resist in dry etching processing , etching properties of the films in oxygen plasma have been investigated
为了探索该种薄膜在干刻蚀工艺过程中用作掩膜的可能性,还研究了它在氧离子体中的刻蚀性能。
5.When the two layers of sio2 with different refractive index are finished , the designed mask pattern is printed on the film by photolithography . after that , icp is performed for dry etching , then , the waveguide structures are obtained . at present , the rudimental graph of edg has been obtained
两层不同折射率的sio _ 2薄膜制备好之后,经过光刻、等离子体刻蚀( icp )的工艺步骤之后,形成了波导结构,初步制作出了器件的图形。
6.This thesis work has researched the fabrication technics of photonic crystal defect waveguide with air - bridge structure and collecting waveguide ; suggested using uv - lithography and wet etching to fabricate traditional waveguide , after that , using eb - lithography and dry etching to fabricate photonic crystal holes , so can reduce the fabrication cost by a big range ; designed the moulding board , which can fabricate the air - bridge structure and is convenient for recognizing position in eb - lithography ; the structure consisted of traditional waveguides and etching grooves are fabricated on soi successfully , then an successful eb - lithography is realized on the structure , the defect waveguide collected with the traditional waveguide quite well ; used the etching grooves to do the sacrificial layer etching experiment , which grounded etching sacrificial layer by photonic crystal holes in next step
提出采用紫外光刻工艺制作传统波导结构之后,通过电子束曝光和干法刻蚀制作光子晶体小孔的工艺方案,大幅度减低了制作成本;设计出可形成空气桥结构、并且适用于电子束曝光位置识别的光刻模板,在soi材料上成功制作出带有空气桥刻蚀预留槽以及接续光波导的结构,在该结构上成功实现了光子晶体带隙波导的电子束曝光,带隙波导与接续光波导位置接续良好;最后利用预留槽进行了刻蚀牺牲层的实验,为下一步利用光子晶体小孔刻蚀牺牲层形成空气桥结构打下了基础。
7.The work mainly consists of four parts : the first part is to use oxidation and lpcvd technique to produce sio2 mask film and si3n4 insulation film in order to enhance the heating efficiency of micro chamber , and guarantee the carry out of the reaction . the second part is to use the combination of dry etching and wet etching to produce reaction micro chamber , it is the container which carry out the pcr reaction , and dna sample carry out amplification reaction here . the third part is to use the sputtering , photolithography to produce heaters and temperature sensors which heat the reaction micro chamber and provide the temperature condition for the pcr reaction
首先,利用氧化工艺和lpcvd技术,生长sio _ 2掩膜层和si _ 3n _ 4绝缘层,以提高反应腔的热效率,保证扩增反应的顺利进行;其次,用湿法腐蚀和干法刻蚀相结合的方法加工微型腔体,使之作为dna样品进行pcr扩增反应的容器;第三,用溅射、光刻等工艺在微型腔体底部制作微型加热器和温度传感器,实现对反应腔体的加热及其温度的精确测量,提供pcr扩增反应所需的温度条件。
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